טוען...
Effect of SiN(x) diffusion barrier thickness on the structural properties and photocatalytic activity of TiO(2) films obtained by sol–gel dip coating and reactive magnetron sputtering
We investigate the effect of the thickness of the silicon nitride (SiN(x)) diffusion barrier on the structural and photocatalytic efficiency of TiO(2) films obtained with different processes. We show that the structural and photocatalytic efficiency of TiO(2) films produced using soft chemistry (sol...
שמור ב:
| הוצא לאור ב: | Beilstein J Nanotechnol |
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| Main Authors: | , , , |
| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
Beilstein-Institut
2015
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| נושאים: | |
| גישה מקוונת: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4660912/ https://ncbi.nlm.nih.gov/pubmed/26665074 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.6.207 |
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