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High throughput optical lithography by scanning a massive array of bowtie aperture antennas at near-field
Optical lithography, the enabling process for defining features, has been widely used in semiconductor industry and many other nanotechnology applications. Advances of nanotechnology require developments of high-throughput optical lithography capabilities to overcome the optical diffraction limit an...
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| Publicado en: | Sci Rep |
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| Main Authors: | , , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Nature Publishing Group
2015
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4630802/ https://ncbi.nlm.nih.gov/pubmed/26525906 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep16192 |
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