Parikh, D., Fouquerel, E., Murphy, C. T., Wang, H., & Opresko, P. L. (2015). Telomeres are partly shielded from ultraviolet-induced damage and proficient for nucleotide excision repair of photoproducts. Nat Commun.

Parikh, Dhvani, Elise Fouquerel, Connor T. Murphy, Hong Wang, and Patricia L. Opresko. "Telomeres Are Partly Shielded From Ultraviolet-induced Damage and Proficient for Nucleotide Excision Repair of Photoproducts." Nat Commun 2015.

Parikh, Dhvani, et al. "Telomeres Are Partly Shielded From Ultraviolet-induced Damage and Proficient for Nucleotide Excision Repair of Photoproducts." Nat Commun 2015.