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Ultralow threading dislocation density in GaN epilayer on near-strain-free GaN compliant buffer layer and its applications in hetero-epitaxial LEDs

High threading dislocation (TD) density in GaN-based devices is a long unresolved problem because of the large lattice mismatch between GaN and the substrate, which causes a major obstacle for the further improvement of next-generation high-efficiency solid-state lighting and high-power electronics....

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Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Shih, Huan-Yu, Shiojiri, Makoto, Chen, Ching-Hsiang, Yu, Sheng-Fu, Ko, Chung-Ting, Yang, Jer-Ren, Lin, Ray-Ming, Chen, Miin-Jang
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2015
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Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4556983/
https://ncbi.nlm.nih.gov/pubmed/26329829
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep13671
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