APA način citiranja

Wei, Y., Pan, F., Zhang, Q., & Ma, P. (2015). Atomic layer deposition for fabrication of HfO(2)/Al(2)O(3) thin films with high laser-induced damage thresholds. Nanoscale Res Lett.

Čikaški stil citiranja

Wei, Yaowei, Feng Pan, Qinghua Zhang, i Ping Ma. "Atomic Layer Deposition for Fabrication of HfO(2)/Al(2)O(3) Thin Films With High Laser-induced Damage Thresholds." Nanoscale Res Lett 2015.

MLA način citiranja

Wei, Yaowei, Feng Pan, Qinghua Zhang, i Ping Ma. "Atomic Layer Deposition for Fabrication of HfO(2)/Al(2)O(3) Thin Films With High Laser-induced Damage Thresholds." Nanoscale Res Lett 2015.