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Surface properties and biocompatibility of nanostructured TiO(2) film deposited by RF magnetron sputtering
Nanostructured TiO(2) films are deposited on a silicon substrate using 150-W power from the RF magnetron sputtering at working pressures of 3 to 5 Pa, with no substrate bias, and at 3 Pa with a substrate bias of −50 V. X-ray diffraction (XRD) analysis reveals that TiO(2) films deposited on unbiased...
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| 出版年: | Nanoscale Res Lett |
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| 主要な著者: | , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer US
2015
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4385009/ https://ncbi.nlm.nih.gov/pubmed/25852353 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0732-7 |
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