A carregar...

Micropatterning of TiO(2) Thin Films by MOCVD and Study of Their Growth Tendency

In this work, we studied the growth tendency of TiO(2) thin films deposited on a narrow-stripe area (<10 μm). TiO(2) thin films were selectively deposited on OTS patterned Si(100) substrates by MOCVD. The experimental data showed that the film growth tendency was divided into two behaviors above...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Hwang, Ki-Hwan, Kang, Byung-Chang, Jung, Duk Young, Kim, Youn Jea, Boo, Jin-Hyo
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2015
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4370045/
https://ncbi.nlm.nih.gov/pubmed/25799219
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep09319
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!