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Micropatterning of TiO(2) Thin Films by MOCVD and Study of Their Growth Tendency
In this work, we studied the growth tendency of TiO(2) thin films deposited on a narrow-stripe area (<10 μm). TiO(2) thin films were selectively deposited on OTS patterned Si(100) substrates by MOCVD. The experimental data showed that the film growth tendency was divided into two behaviors above...
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| Publicado no: | Sci Rep |
|---|---|
| Main Authors: | , , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Publishing Group
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4370045/ https://ncbi.nlm.nih.gov/pubmed/25799219 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep09319 |
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