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Aluminum silicide microparticles transformed from aluminum thin films by hypoeutectic interdiffusion
Aluminum silicide microparticles with oxidized rough surfaces were formed on Si substrates through a spontaneous granulation process of Al films. This microparticle formation was caused by interdiffusion of Al and Si atoms at hypoeutectic temperatures of Al-Si systems, which was driven by compressiv...
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer
2014
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| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4074387/ https://ncbi.nlm.nih.gov/pubmed/24994964 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-312 |
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