Direct fabrication of graphene on SiO(2) enabled by thin film stress engineering

We demonstrate direct production of graphene on SiO(2) by CVD growth of graphene at the interface between a Ni film and the SiO(2) substrate, followed by dry mechanical delamination of the Ni using adhesive tape. This result is enabled by understanding of the competition between stress evolution and...

Descripció completa

Guardat en:
Dades bibliogràfiques
Autors principals: McNerny, Daniel Q., Viswanath, B., Copic, Davor, Laye, Fabrice R., Prohoda, Christophor, Brieland-Shoultz, Anna C., Polsen, Erik S., Dee, Nicholas T., Veerasamy, Vijayen S., Hart, A. John
Format: Artigo
Idioma:Inglês
Publicat: Nature Publishing Group 2014
Matèries:
Article
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4031480/
https://ncbi.nlm.nih.gov/pubmed/24854632
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep05049
Etiquetes: Afegir etiqueta
Sense etiquetes, Sigues el primer a etiquetar aquest registre!

Ítems similars