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Direct fabrication of graphene on SiO(2) enabled by thin film stress engineering
We demonstrate direct production of graphene on SiO(2) by CVD growth of graphene at the interface between a Ni film and the SiO(2) substrate, followed by dry mechanical delamination of the Ni using adhesive tape. This result is enabled by understanding of the competition between stress evolution and...
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| Autors principals: | , , , , , , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Nature Publishing Group
2014
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4031480/ https://ncbi.nlm.nih.gov/pubmed/24854632 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep05049 |
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