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Probing the Role of an Atomically Thin SiN(x) Interlayer on the Structure of Ultrathin Carbon Films
Filtered cathodic vacuum arc (FCVA) processed carbon films are being considered as a promising protective media overcoat material for future hard disk drives (HDDs). However, at ultrathin film levels, FCVA-deposited carbon films show a dramatic change in their structure in terms of loss of sp(3) bon...
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| Autors principals: | , , , , , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Nature Publishing Group
2014
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4028925/ https://ncbi.nlm.nih.gov/pubmed/24846506 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep05021 |
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