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Structural and mechanical evolution of reactively and non-reactively sputtered Zr–Al–N thin films during annealing()
The influence of reactive and non-reactive sputtering on structure, mechanical properties, and thermal stability of Zr(1 − x)Al(x)N thin films during annealing to 1500 °C is investigated in detail. Reactive sputtering of a Zr(0.6)Al(0.4) target leads to the formation of Zr(0.66)Al(0.34)N thin films,...
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| Main Authors: | , , , |
|---|---|
| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe: |
Elsevier Sequoia
2014
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| Ábhair: | |
| Rochtain Ar Líne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3990427/ https://ncbi.nlm.nih.gov/pubmed/24748705 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1016/j.surfcoat.2014.01.049 |
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