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Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

The basic idea of using hexagonally ordered arrays of Au nanoparticles (NP) on top of a given substrate as a mask for the subsequent anisotropic etching in order to fabricate correspondingly ordered arrays of nanopillars meets two serious obstacles: The position of the NP may change during the etchi...

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Detalhes bibliográficos
Main Authors: Özdemir, Burcin, Seidenstücker, Axel, Plettl, Alfred, Ziemann, Paul
Formato: Artigo
Idioma:Inglês
Publicado em: Beilstein-Institut 2013
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3869346/
https://ncbi.nlm.nih.gov/pubmed/24367758
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.4.100
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