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Hyperuniformity in amorphous silicon based on the measurement of the infinite-wavelength limit of the structure factor

We report the results of highly sensitive transmission X-ray scattering measurements performed at the Advanced Photon Source, Argonne National Laboratory, on nearly fully dense high-purity amorphous-silicon (a-Si) samples for the purpose of determining their degree of hyperuniformity. A perfectly hy...

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Bibliografiske detaljer
Main Authors: Xie, Ruobing, Long, Gabrielle G., Weigand, Steven J., Moss, Simon C., Carvalho, Tobi, Roorda, Sjoerd, Hejna, Miroslav, Torquato, Salvatore, Steinhardt, Paul J.
Format: Artigo
Sprog:Inglês
Udgivet: National Academy of Sciences 2013
Fag:
Online adgang:https://ncbi.nlm.nih.gov/pmc/articles/PMC3746861/
https://ncbi.nlm.nih.gov/pubmed/23898166
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1073/pnas.1220106110
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