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Low-temperature synthesis of graphene on Cu using plasma-assisted thermal chemical vapor deposition
Plasma-assisted thermal chemical vapor deposition (CVD) was carried out to synthesize high-quality graphene film at a low temperature of 600°C. Monolayer graphene films were thus synthesized on Cu foil using various ratios of hydrogen and methane in a gaseous mixture. The in situ plasma emission spe...
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| Main Authors: | , , , , , |
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| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Springer
2013
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| Teme: | |
| Online dostop: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3682863/ https://ncbi.nlm.nih.gov/pubmed/23758668 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-285 |
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