Zhao, Y., Zhou, C., Zhang, X., Zhang, P., Dou, Y., Wang, W., . . . Zhou, S. (2013). Passivation mechanism of thermal atomic layer-deposited Al(2)O(3) films on silicon at different annealing temperatures. Springer.
استشهاد بنمط شيكاغوZhao, Yan, et al. Passivation Mechanism of Thermal Atomic Layer-deposited Al(2)O(3) Films On Silicon At Different Annealing Temperatures. Springer, 2013.
MLA استشهادZhao, Yan, et al. Passivation Mechanism of Thermal Atomic Layer-deposited Al(2)O(3) Films On Silicon At Different Annealing Temperatures. Springer, 2013.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.