Fiorenza, P., Giannazzo, F., Swanson, L. K., Frazzetto, A., Lorenti, S., Alessandrino, M. S., & Roccaforte, F. (2013). A look underneath the SiO(2)/4H-SiC interface after N(2)O thermal treatments. Beilstein-Institut.
Citación estilo ChicagoFiorenza, Patrick, Filippo Giannazzo, Lukas K. Swanson, Alessia Frazzetto, Simona Lorenti, Mario S. Alessandrino, y Fabrizio Roccaforte. A Look Underneath the SiO(2)/4H-SiC Interface After N(2)O Thermal Treatments. Beilstein-Institut, 2013.
Cita MLAFiorenza, Patrick, et al. A Look Underneath the SiO(2)/4H-SiC Interface After N(2)O Thermal Treatments. Beilstein-Institut, 2013.
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