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High-Throughput Top-Down Fabrication of Uniform Magnetic Particles
Ion Beam Aperture Array Lithography was applied to top-down fabrication of large dense (10(8)–10(9) particles/cm(2)) arrays of uniform micron-scale particles at rates hundreds of times faster than electron beam lithography. In this process, a large array of helium ion beamlets is formed when a stenc...
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| Main Authors: | , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
Public Library of Science
2012
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3365077/ https://ncbi.nlm.nih.gov/pubmed/22693574 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1371/journal.pone.0037440 |
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