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Complex three-dimensional high aspect ratio microfluidic network manufactured in combined PerMX dry-resist and SU-8 technology

In this paper we present a new fabrication method that combines for the first time popular SU-8 technology and PerMX dry-photoresist lamination for the manufacturing of high aspect ratio three-dimensional multi-level microfluidic networks. The potential of this approach, which further benefits from...

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Detalhes bibliográficos
Main Authors: Meier, Robert Ch., Badilita, Vlad, Brunne, Jens, Wallrabe, Ulrike, Korvink, Jan G.
Formato: Artigo
Idioma:Inglês
Publicado em: American Institute of Physics 2011
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3364826/
https://ncbi.nlm.nih.gov/pubmed/22662038
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.3613668
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