APA aipamena

Ma, S., Con, C., Yavuz, M., & Cui, B. (2011). Polystyrene negative resist for high-resolution electron beam lithography. Springer.

Chicago Style aipamena

Ma, Siqi, Celal Con, Mustafa Yavuz, and Bo Cui. Polystyrene Negative Resist for High-resolution Electron Beam Lithography. Springer, 2011.

MLA aipamena

Ma, Siqi, Celal Con, Mustafa Yavuz, and Bo Cui. Polystyrene Negative Resist for High-resolution Electron Beam Lithography. Springer, 2011.