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Silicon Nano-well Arrays for Reliable Pattern Transfer and Locally Confined High Temperature Reactions
Si nano-well arrays, with precisely controlled undercut Si sidewall profiles and flat bottomed pockets, enable uniform nanoscale pattern transfer from resists to metal deposits without degradation of the initial lithographic resolution, as verified by formation of arrays of Au nano-dots with 10 nm d...
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| Main Authors: | , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2011
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3167870/ https://ncbi.nlm.nih.gov/pubmed/21709347 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/0957-4484/22/30/305304 |
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