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Two-step photolithography to fabricate multilevel microchannels

In this paper, we study the variation of the thickness of patterned microchannel features in photoresist (PR) by two-step photolithography. The final PR thickness is determined by the thickness and width of the predefined PR pattern in the first-step lithography and the thickness of the spin-coated...

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Detalhes bibliográficos
Main Authors: Choi, Sungyoung, Park, Je-Kyun
Formato: Artigo
Idioma:Inglês
Publicado em: American Institute of Physics 2010
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC2998036/
https://ncbi.nlm.nih.gov/pubmed/21139701
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.3517230
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