A carregar...
Two-step photolithography to fabricate multilevel microchannels
In this paper, we study the variation of the thickness of patterned microchannel features in photoresist (PR) by two-step photolithography. The final PR thickness is determined by the thickness and width of the predefined PR pattern in the first-step lithography and the thickness of the spin-coated...
Na minha lista:
| Main Authors: | , |
|---|---|
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Institute of Physics
2010
|
| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2998036/ https://ncbi.nlm.nih.gov/pubmed/21139701 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1063/1.3517230 |
| Tags: |
Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!
|