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Which Photodiode to Use: A Comparison of CMOS-Compatible Structures
While great advances have been made in optimizing fabrication process technologies for solid state image sensors, the need remains to be able to fabricate high quality photosensors in standard CMOS processes. The quality metrics depend on both the pixel architecture and the photosensitive structure....
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Main Authors: | , , , |
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Formato: | Artigo |
Idioma: | Inglês |
Publicado em: |
2009
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Assuntos: | |
Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2863350/ https://ncbi.nlm.nih.gov/pubmed/20454596 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1109/JSEN.2009.2021805 |
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