APA aipamena

Dubey, M., Emoto, K., Cheng, F., Gamble, L. J., Takahashi, H., Grainger, D. W., & Castner, D. G. (2009). Surface Analysis of Photolithographic Patterns using ToF-SIMS and PCA.

Chicago Style aipamena

Dubey, Manish, Kazunori Emoto, Fang Cheng, Lara J. Gamble, Hironobu Takahashi, David W. Grainger, and David G. Castner. Surface Analysis of Photolithographic Patterns Using ToF-SIMS and PCA. 2009.

MLA aipamena

Dubey, Manish, et al. Surface Analysis of Photolithographic Patterns Using ToF-SIMS and PCA. 2009.

Kontuz: berrikusi erreferentzia hauek erabili aurretik.