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Effects of unique ion chemistry on thin-film growth by plasma–surface interactions
Plasma processing is a standard industrial method for the modification of material surfaces and the deposition of thin films. Polyatomic ions and neutrals larger than a triatomic play a critical role in plasma-induced surface chemistry, especially in the deposition of polymeric films from fluorocarb...
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| Huvudupphovsmän: | , , , |
|---|---|
| Materialtyp: | Artigo |
| Språk: | Inglês |
| Publicerad: |
The National Academy of Sciences
2000
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| Ämnen: | |
| Länkar: | https://ncbi.nlm.nih.gov/pmc/articles/PMC26609/ https://ncbi.nlm.nih.gov/pubmed/10618364 |
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