The two major spore DNA repair pathways, nucleotide excision repair and spore photoproduct lyase, are sufficient for the resistance of Bacillus subtilis spores to artificial UV-C and UV-B but not to solar radiation.
Bacterial endospores are 1 to 2 orders of magnitude more resistant to 254-nm UV (UV-C) radiation than are exponentially growing cells of the same strain. This high UV resistance is due to two related phenomena: (i) DNA of dormant spores irradiated with 254-nm UV accumulates mainly a unique thymine d...
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| Publicado no: | Appl Environ Microbiol |
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| Principais autores: | , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
American Society for Microbiology (ASM)
1996
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.govhttps://pmc.ncbi.nlm.nih.gov/articles/PMC168002/ https://ncbi.nlm.nih.govhttps://pubmed.ncbi.nlm.nih.gov/8779559/ https://ncbi.nlm.nih.govhttps://doi.org/10.1128/aem.62.7.2221-2227.1996 |
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