Fabrication of patterned DNA surfaces.

Two photolithographic methods are described for the formation of patterned single or multiple DNA species on SiO2 substrates. In the first approach, substrates are treated with a photochemically labile organosilane monolayer film. Irradiation of these surfaces with patterned deep UV (193 nm) light r...

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Main Authors: Chrisey, L A, O'Ferrall, C E, Spargo, B J, Dulcey, C S, Calvert, J M
Format: Artigo
Jezik:Inglês
Izdano: 1996
Teme:
Research Article
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC146049/
https://ncbi.nlm.nih.gov/pubmed/8760891
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