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Copper-ion-dependent damage to the bases in DNA in the presence of hydrogen peroxide.

Mixtures of Cu2+ and H2O2 at pH 7.4 caused damage to the bases in DNA greater than that caused by mixtures of Fe3+ and H2O2. Addition of ascorbic acid to the Cu2+/H2O2 system caused a very large increase in base damage, much greater than that produced by the Fe3+/H2O2/ascorbic acid system. The produ...

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Sonraí Bibleagrafaíochta
Main Authors: Aruoma, O I, Halliwell, B, Gajewski, E, Dizdaroglu, M
Formáid: Artigo
Teanga:Inglês
Foilsithe: 1991
Ábhair:
Rochtain Ar Líne:https://ncbi.nlm.nih.gov/pmc/articles/PMC1149805/
https://ncbi.nlm.nih.gov/pubmed/1899997
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