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Film deposition by thermal laser evaporation
We study the thermal evaporation of materials by irradiation with laser light to deposit layers with atomically precise thickness. Under ultrahigh to moderate vacuum pressures, a focused laser beam is directed to the front surface of a source target to heat it to temperatures suitable for thermal ev...
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| Autors principals: | , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
AIP Publishing LLC
2019-08-01
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| Col·lecció: | AIP Advances |
| Accés en línia: | http://dx.doi.org/10.1063/1.5111678 |
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