Expeditious and eco-friendly solution-free self-patterning of sol–gel oxide semiconductor thin films

Due to its simplicity and low-cost manufacturing, self-patterning has been considered a promising candidate to replace conventional photolithography. However, most solution-based self-patterning methods require toxic materials, lengthy processes and generate extensive material waste, thus hindering...

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Bibliografiske detaljer
Main Authors: Do-Kyung Kim, Jun-Ik Park, Jaewon Jang, In Man Kang, Jaehoon Park, Jin-Hyuk Bae
Format: Artigo
Sprog:Inglês
Udgivet: Elsevier 2020-09-01
Serier:Materials & Design
Fag:
Oxide semiconductor
Sol–gel
Self-patterning
Solution-free
Eco-friendly
Leakage currents
Online adgang:http://www.sciencedirect.com/science/article/pii/S0264127520304834
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