Atomic Layer Deposition TiO2 Films and TiO2/SiNx Stacks Applied for Silicon Solar Cells

Titanium oxide (TiO2) films and TiO2/SiNx stacks have potential in surface passivation, anti-reflection coatings and carrier-selective contact layers for crystalline Si solar cells. A Si wafer, deposited with 8-nm-thick TiO2 film by atomic layer deposition, has a surface recombination velocity as lo...

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Main Authors: Zu-Po Yang, Hsyi-En Cheng, I-Hsuan Chang, Ing-Song Yu
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2016-08-01
Colecção:Applied Sciences
Assuntos:
titanium oxide
atomic layer deposition
anatase
surface passivation
antireflection coating
carrier selective contact
silicon solar cell
Acesso em linha:http://www.mdpi.com/2076-3417/6/8/233
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