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Convergence Of Iterative Solvers For Non-Linear Step-And-Flash Imprint Lithography Simulations

The paper presents the analysis of the iterative solvers utilized to solve the non-linear problemof Step-and-Flash Imprint Lithography (SFIL) a modern patterning process. The simulationsconsists in solving molecular statics problem for the polymer network, with quadratic potentials.The model disting...

पूर्ण विवरण

में बचाया:
ग्रंथसूची विवरण
मुख्य लेखक: Maciej Paszyński
स्वरूप: Artigo
भाषा:Inglês
प्रकाशित: AGH University of Science and Technology Press 2011-01-01
श्रृंखला:Computer Science
विषय:
ऑनलाइन पहुंच:http://journals.agh.edu.pl/csci/article/download/101/47
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