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Effect of Ar+ beam sputtering on the magnetic anisotropy of Fe thin films deposited on the MgO(001) substrate
The Fe thin films with different initial thickness were prepared on MgO(001) substrate. Ar+ ion beam having energy of 3 keV was used to sputter the film at incident angle of 80° with respect to the film normal. Low energy electron diffraction (LEED) was employed to study the morphology and crystal q...
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| Hlavní autoři: | , , , , , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Elsevier
2017-01-01
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| Edice: | Results in Physics |
| On-line přístup: | http://www.sciencedirect.com/science/article/pii/S2211379717304813 |
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