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Investigation of Conductive Mechanism of Amorphous IGO Resistive Random-Access Memory with Different Top Electrode Metal

In this paper, resistive random-access memory (RRAM) with InGaO (IGO) as an active layer was fabricated by radio-frequency (RF) sputtering system and the resistive switching mechanism with the different top electrode (TE) of Pt, Ti, and Al were investigated. The Pt/IGO/Pt/Ti RRAM exhibits typical bi...

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Autores principales: Wei-Lun Huang, Yong-Zhe Lin, Sheng-Po Chang, Shoou-Jinn Chang
Formato: Artigo
Lenguaje:Inglês
Publicado: MDPI AG 2020-05-01
Colección:Coatings
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Acceso en línea:https://www.mdpi.com/2079-6412/10/5/504
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