Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

The NbNx>1 coatings were deposited on Si wafer and SUS 304 stainless steel substrates by a high power impulse magnetron sputtering (HiPIMS) system at various bias voltages and the ratios of nitrogen and argon (N2/Ar). By virtue of electron probe microanalysis (EPMA), X-ray diffraction pattern...

Descrizione completa

Salvato in:
Dettagli Bibliografici
Autori principali: Jicheng Ding, Tengfei Zhang, Haijuan Mei, Je Moon Yun, Seong Hee Jeong, Qimin Wang, Kwang Ho Kim
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI AG 2017-12-01
Serie:Coatings
Soggetti:
NbNx&gt
1 coating
HiPIMS
bias voltage
N2/Ar ratio
microstructure
mechanical properties
Accesso online:https://www.mdpi.com/2079-6412/8/1/10
Tags: Aggiungi Tag
Nessun Tag, puoi essere il primo ad aggiungerne! !

Documenti analoghi