Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

The NbNx>1 coatings were deposited on Si wafer and SUS 304 stainless steel substrates by a high power impulse magnetron sputtering (HiPIMS) system at various bias voltages and the ratios of nitrogen and argon (N2/Ar). By virtue of electron probe microanalysis (EPMA), X-ray diffraction pattern...

Description complète

Enregistré dans:
Détails bibliographiques
Auteurs principaux: Jicheng Ding, Tengfei Zhang, Haijuan Mei, Je Moon Yun, Seong Hee Jeong, Qimin Wang, Kwang Ho Kim
Format: Artigo
Langue:Inglês
Publié: MDPI AG 2017-12-01
Collection:Coatings
Sujets:
NbNx&gt
1 coating
HiPIMS
bias voltage
N2/Ar ratio
microstructure
mechanical properties
Accès en ligne:https://www.mdpi.com/2079-6412/8/1/10
Tags: Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!

Documents similaires