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Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System
The NbNx>1 coatings were deposited on Si wafer and SUS 304 stainless steel substrates by a high power impulse magnetron sputtering (HiPIMS) system at various bias voltages and the ratios of nitrogen and argon (N2/Ar). By virtue of electron probe microanalysis (EPMA), X-ray diffraction pattern...
Tallennettuna:
Päätekijät: | , , , , , , |
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Aineistotyyppi: | Artigo |
Kieli: | Inglês |
Julkaistu: |
MDPI AG
2017-12-01
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Sarja: | Coatings |
Aiheet: | |
Linkit: | https://www.mdpi.com/2079-6412/8/1/10 |
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