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H2O/O2 Vapor Annealing Effect on Spin Coating Alumina Thin Films for Passivation of Silicon Solar Cells

Aluminum acetylacetonate-based AlOx thin films were introduced as a low-cost, high-quality passivation layers for crystalline silicon solar cells. Films were formed by a spin coating method on p-type silicon substrates at 450°C in ambient air, O2, or water vapor (H2O/O2) for 15 or 120 min. XPS analy...

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Autores principales: Abdullah Uzum, Hiroyuki Kanda, Takuma Noguchi, Yuya Nakazawa, Shota Taniwaki, Yasushi Hotta, Yuichi Haruyama, Naoyuki Shibayama, Seigo Ito
Formato: Artigo
Lenguaje:Inglês
Publicado: Hindawi Limited 2019-01-01
Colección:International Journal of Photoenergy
Acceso en línea:http://dx.doi.org/10.1155/2019/4604932
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