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A high entropy silicide by reactive spark plasma sintering
Abstract A high-entropy silicide (HES), (Ti0.2Zr0.2Nb0.2Mo0.2W0.2)Si2 with close-packed hexagonal structure is successfully manufactured through reactive spark plasma sintering at 1300 °C for 15 min. The elements in this HES are uniformly distributed in the specimen based on the energy dispersive sp...
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| Main Authors: | , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
SpringerOpen
2019-03-01
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| Colecção: | Journal of Advanced Ceramics |
| Assuntos: | |
| Acesso em linha: | http://link.springer.com/article/10.1007/s40145-019-0319-3 |
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