Comparison between the UV and X-ray Photosensitivities of Hybrid TiO<sub>2</sub>-SiO<sub>2</sub> Thin Layers

The photo-induced effects on sol–gel-based organo TiO<sub>2</sub>-SiO<sub>2</sub> thin layers deposited by the dip-coating technique have been investigated using two very different light sources: A light-emitting diode (LED) emitting in the UV (at 365 nm, 3.4 eV) and an X-ray...

Description complète

Enregistré dans:
Détails bibliographiques
Auteurs principaux: Maxime Royon, Francis Vocanson, Damien Jamon, Emmanuel Marin, Adriana Morana, Aziz Boukenter, Sylvain Girard, Youcef Ouerdane, François Royer, Yves Jourlin
Format: Artigo
Langue:Inglês
Publié: MDPI AG 2020-08-01
Collection:Materials
Sujets:
sol–gel materials
X-ray photolithography
FTIR spectroscopy
photopolymerization
Accès en ligne:https://www.mdpi.com/1996-1944/13/17/3730
Tags: Ajouter un tag
Pas de tags, Soyez le premier à ajouter un tag!

Documents similaires