Comparison between the UV and X-ray Photosensitivities of Hybrid TiO<sub>2</sub>-SiO<sub>2</sub> Thin Layers

The photo-induced effects on sol–gel-based organo TiO<sub>2</sub>-SiO<sub>2</sub> thin layers deposited by the dip-coating technique have been investigated using two very different light sources: A light-emitting diode (LED) emitting in the UV (at 365 nm, 3.4 eV) and an X-ray...

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Detalhes bibliográficos
Main Authors: Maxime Royon, Francis Vocanson, Damien Jamon, Emmanuel Marin, Adriana Morana, Aziz Boukenter, Sylvain Girard, Youcef Ouerdane, François Royer, Yves Jourlin
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2020-08-01
Colecção:Materials
Assuntos:
sol–gel materials
X-ray photolithography
FTIR spectroscopy
photopolymerization
Acesso em linha:https://www.mdpi.com/1996-1944/13/17/3730
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