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Numerical Simulation of Plasma-Dynamical Processes in the Technological Inductively Coupled RF Plasmatron with Gas Cooling

<p>The electrodeless inductively coupled RF plasmatron (ICP) torches became widely used in various fields of engineering, science and technology. Presently, owing to development of new technologies to produce very pure substances, nanopowders, etc., there is a steadily increasing interest in t...

詳細記述

保存先:
書誌詳細
主要な著者: Yu. M. Grishin, L. Miao
フォーマット: Artigo
言語:Russo
出版事項: MGTU im. N.È. Baumana 2016-01-01
シリーズ:Nauka i Obrazovanie
主題:
ICP
オンライン・アクセス:http://technomag.edu.ru/jour/article/view/864
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