ロード中...
Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFe<i><sub>x</sub></i>O<i><sub...
保存先:
| 主要な著者: | , , , , , |
|---|---|
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI AG
2020-03-01
|
| シリーズ: | Coatings |
| 主題: | |
| オンライン･アクセス: | https://www.mdpi.com/2079-6412/10/3/232 |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|