Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System

A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFe<i><sub>x</sub></i>O<i><sub...

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Detalles Bibliográficos
Autores principales: Zdenek Hubička, Martin Zlámal, Jiri Olejníček, Drahoslav Tvarog, Martin Čada, Josef Krýsa
Formato: Artigo
Lenguaje:Inglês
Publicado: MDPI AG 2020-03-01
Colección:Coatings
Materias:
photocathode film
r-hipims + ecwr plasma
r-hipims plasma
copper iron oxide
photocurrent
Acceso en línea:https://www.mdpi.com/2079-6412/10/3/232
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