The axial profile of plasma characteristics of cylindrical magnetron sputtering device
In the present work, a d.c. magnetron sputtering system was designed and fabricated. The chamber of this system was includes from two copper coaxial cylinders where the inner one used as a cathode (target) while the outer one used as the anode with Solenoid magnetic coil located on the outer cylind...
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
University of Baghdad
2010-10-01
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| Schriftenreihe: | Iraqi Journal of Physics |
| Schlagworte: | |
| Online-Zugang: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/861 |
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