Atomic layer deposition and properties of ZrO2/Fe2O3 thin films
Thin solid films consisting of ZrO2 and Fe2O3 were grown by atomic layer deposition (ALD) at 400 °C. Metastable phases of ZrO2 were stabilized by Fe2O3 doping. The number of alternating ZrO2 and Fe2O3 deposition cycles were varied in order to achieve films with different cation ratios. The influence...
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| Principais autores: | , , , , , , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Beilstein-Institut
2018-01-01
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| coleção: | Beilstein Journal of Nanotechnology |
| Assuntos: | |
| Acesso em linha: | https://doi.org/10.3762/bjnano.9.14 |
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