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Conventional optical microscopy is fundamentally constrained by the optical diffraction limit (~200 nm), restricting the observation of nanoscale features in advanced manufacturing. To address this challenge, a remote-mode microsphere-enabled nanoscale imaging technology has been developed and succe...

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Autors principals:	Zheting Meng, Lianwei Chen, Mingbo Pu, Xiangang Luo, Minghui Hong
Format:	Artigo
Idioma:	Inglês
Publicat:	Editorial Office of Opto-Electronic Journals Group, Institute of Optics and Electronics, CAS, China 2026-03-01
Col·lecció:	Opto-Electronic Advances
Matèries:	optical microscopy nano-imaging label-free optical diffraction limit
Accés en línia:	https://www.oejournal.org/article/doi/10.29026/oea.2026.260073
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