Antireflective SiC Surface Fabricated by Scalable Self-Assembled Nanopatterning

An approach for fabricating sub-wavelength antireflective structures on SiC material is demonstrated. A time-efficient scalable nanopatterning method by rapid thermal annealing of thin metal film is applied followed by a dry etching process. Size-dependent optical properties of the antireflective Si...

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Hlavní autoři:	Yiyu Ou, Ahmed Fadil, Haiyan Ou
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	MDPI AG 2016-09-01
Edice:	Micromachines
Témata:	rapid thermal process self-assembled nanopattern antireflective surface sub-wavelength structure silicon carbide
On-line přístup:	http://www.mdpi.com/2072-666X/7/9/152
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