A lifting-wavelet-based iterative thresholding correction for atomic force microscopy images with vertical distortion
To eliminate distortion caused by vertical drift and illusory slopes in atomic force microscopy (AFM) imaging, a lifting-wavelet-based iterative thresholding correction method is proposed in this paper. This method achieves high-quality AFM imaging via line-by-line corrections for each distorted pro...
Gorde:
| Egile Nagusiak: | , , |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
AIP Publishing LLC
2025-09-01
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| Saila: | Nanotechnology and Precision Engineering |
| Sarrera elektronikoa: | http://dx.doi.org/10.1063/10.0034751 |
| Etiketak: |
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