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Development of a Noninvasive Real-Time Ion Energy Distribution Monitoring System Applicable to Collisional Plasma Sheath

As the importance of ion-assisted surface processing based on low-temperature plasma increases, the monitoring of ion energy impinging into wafer surfaces becomes important. Monitoring methods that are noninvasive, real-time, and comprise ion collision in the sheath have received much research atten...

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Autors principals: Inho Seong, Sijun Kim, Youngseok Lee, Chulhee Cho, Jangjae Lee, Wonnyoung Jeong, Yebin You, Shinjae You
Format: Artigo
Idioma:Inglês
Publicat: MDPI AG 2022-08-01
Col·lecció:Sensors
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Accés en línia:https://www.mdpi.com/1424-8220/22/16/6254
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