Deposition of the TiN and TiO2 films in the inverted cylindrical direct-current magnetron by a reactive sputtering
Results of research of optical radiation of discharge plasma in a wave range 350 – 820 nm and discharge voltage of an inverted cylindrical magnetron at various flows of reactive gases (N2, О2) are presented. Changes of discharge voltage have features which can be compared to a films composition and...
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| Auteurs principaux: | , |
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| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Politehperiodika
2008-08-01
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| Collection: | Tekhnologiya i Konstruirovanie v Elektronnoi Apparature |
| Sujets: | |
| Accès en ligne: | http://www.tkea.com.ua/tkea/2008/4_2008/pdf/12.zip |
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